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MIT2-830JS08

by: MIT OpenCourseWare

Publication date: 2008

Usage: Attribution-Noncommercial-Share Alike 3.0

Topics: process control, manufacturing process, discrete system, feedback control theory, empirical, adaptive, modeling, off-line optimization, statistical process control, real-time control, 2.830J, 2.830, robustness, Shewhart Hypothesis, semiconductor manufacturing

Language: English

This course explores statistical modeling and control in manufacturing processes. Topics include the use of experimental design and response surface modeling to understand manufacturing process physics, as well as defect and parametric yield modeling and optimization. Various forms of process control, including statistical process control, run by run and adaptive control, and real-time feedback control, are covered. Application contexts include semiconductor manufacturing, conventional metal and polymer processing, and emerging micro-nano manufacturing processes.

Addeddate: 2009-10-01 13:59:10

Color: color

Identifier: MIT2-830JS08

Sound: sound

Year: 2008

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